Low temperature Technology Receiving Micro and Nano Devices

Author: Amiran Bibilashvili
Co-authors: A.Bibilashvili, Z. Jibuti, Z.Kushitashvili
Keywords: Fotostimulation, difussion, transistor, memristor, plasma, anodizing
Annotation:

1. Shown p-n janction on n type silicon by stimulated diffusion boron from the unlimit source. 2. Created two gates field effect transisitor, where the gate dielectric HfO2 is received by stimulated plasma anodizing. 3. Shown memristor based on TiO2 received by magnetron sputtering with oxygen and argon defferent parcial presures. Volt-Ampheric characterization shows histeresis, which prufes the high memristive properties.

Lecture files:

თსუ კონფცIV-1 [ka]